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Engineering magnetic topological insulators in Eu-based Zintls

ORAL

Abstract

In Zintl materials, the rocksalt-like charge separation between the cationic and anionic frameworks offers a vital platform for the exploration of magnetic topological insulators. When the cations are magnetic and the anions are non-magnetic, it often causes the materials to behave as two independent subunits, with separate magnetic and electronic behaviors. In addition, the clear separation between the electronic and magnetic energy scales allows us to tune the electronic structure of the polyanionic network and then consider the effect of magnetism. This band engineering approach is achieved by employing doping, element substitution, pressure, and epitaxial strain. Specifically, starting from the trivial antiferromagnetic insulator Eu5In2Sb6, we utilize density functional theory to engineer band inversions by applying chemical pressure via isoelectronic substitution, and use external pressure and epitaxial strain to control the bulk energy gaps. Our approach results in the prediction of three new antiferromagnetic topological insulator candidates: Eu5Ga2Sb6, Eu5Tl2Sb6, and Eu5In2Bi6.

Presenters

  • Nicodemos Varnava

    Rutgers University, New Brunswick, Rutgers University

Authors

  • Nicodemos Varnava

    Rutgers University, New Brunswick, Rutgers University

  • David Vanderbilt

    Rutgers University, Rutgers University, New Brunswick

  • Tyrel M McQueen

    Johns Hopkins University, Department of Chemistry, The Johns Hopkins University

  • Tanya Berry

    Johns Hopkins University

  • Vincent C Morano

    Johns Hopkins University

  • Rishi Bhandia

    Johns Hopkins University

  • Anaelle Legros

    Johns Hopkins University

  • Will Liang

    Johns Hopkins University

  • Chris J Lygouras

    Johns Hopkins University, John Hopkins University

  • Thomas J Halloran

    Johns Hopkins University

  • Collin L Broholm

    Johns Hopkins University, John Hopkins University

  • Jonathan Gaudet

    National Institute of Standards and Technology, Johns Hopkins University

  • Guangyong Xu

    NIST

  • Jeffrey W Lynn

    National Institute of Standards and Tech, National Institute of Standards and Technology