Durable anti-fogging coatings via surface-initiated photopolymerization

The covalent attachment of polymers has emerged as a powerful strategy for the preparation of multi-functional surfaces. Patterned, surface-grafted polymer brushes provide spatial control over a variety of physical properties and allow for fabrication of ‘intelligent’ substrates which selectively adapt to their environment. However, the route towards such patterned polymer brush surfaces often remains challenging, creating a demand for more efficient and less complicated fabrication strategies. Here, we describe recent advances in our group in reduction photolithography to produce topographically and chemically pattern polymer brushes by using light-mediated controlled radical polymerization. We highlight the use of these approaches to engineer durable polymer brush films with functional surface properties, specifically anti-fogging activity. Further, we highlight recent work on a facile photolithography setup based on LED digital light projection as an inexpensive, push-of-a-button platform for topographically and chemically patterned surfaces under ambient conditions and open to air.