First-principles study of planar Humble defects in Ge and GeSi alloys
ORAL
Abstract
Planar defects are widespread in group IV elements. The Humble defect is a special type of {001} planar defect that has gained much attention in recent years since its experimental observation in Ge and Ge0.8Si0.2. A detailed study of the electronic properties of Humble defects is still lacking in the literature. In this work, we perform first-principles density functional theory (DFT) calculations to study Humble defects in both Ge and Ge0.8Si0.2. We further compare our theoretical results with Si L3 edge electron energy loss spectra (EELS) measured at room temperature, finding excellent agreement, but only when core-hole effects are accounted for. Moreover, a comparison of the EELS observed in the vicinity of the Humble defect versus in the bulk provides a fingerprint for different types of local atomic-bonding environments in Ge0.8Si0.2. Our DFT calculations reveal that Humble defects can enlarge the electronic band gap, and hence may potentially be used in band engineering. DFT studies using a hybrid functional, which provides an improved description of band gaps, are also presented.
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Presenters
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Shang Ren
Rutgers University
Authors
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Shang Ren
Rutgers University
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Hongbin Yang
Rutgers, The State University of New Jersey
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Sobhit Singh
Rutgers University, Rutgers University, New Brunswick
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Eric Garfunkel
Rutgers University
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David Vanderbilt
Rutgers University, Rutgers University, New Brunswick