Reversal of Tunneling Electroresistance in Ferroelectric Tunnel Junctions by Interface Engineering
ORAL
Abstract
The tunneling electroresistance (TER) effect is a sizable change in resistance upon the reversal of ferroelectric polarization in a ferroelectric tunnel junction (FTJ), which consists of two metal electrodes separated by a nm-thick ferroelectric barrier. Usually, for TER, the resistance is expected to be low (high) when polarization points to the electrode with a longer (shorter) screening length. We show, however, that this observation is not always valid, and TER can be reversed by changing the interface termination. Using density functional theory calculations, we demonstrate that the sign of TER in a La1-xSrxMnO3/BaTiO3/Pt FTJ depends on the interface termination, either La1-xSrxO/TiO2 or MnO2/BaO. Due to the opposite sign of interfacial ionic charges, these interfaces shift the Fermi energy of La1-xSrxMnO3 closer to either the conduction band minimum (La1-xSrxO/TiO2) or the valence band maximum (MnO2/BaO) of BaTiO3 resulting in the crossover between electron and hole tunneling. Due to the opposite energy dependence of the tunneling probability, these two tunneling regimes exhibit a reversed TER.
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Presenters
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Ming Li
University of Nebraska - Lincoln
Authors
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Ming Li
University of Nebraska - Lincoln
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Lingling Tao
University of Nebraska - Lincoln
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Evgeny Y Tsymbal
University of Nebraska - Lincoln, Department of Physics and Astronomy, Nebraska Center for Materials and Nanoscience, University of Nebraska, Lincoln, Department of Physics and Astronomy & Nebraska Center for Materials and Nanoscience, University of Nebraska - Lincoln