APS Logo

Challenges for integrating first principles theory and X-ray reflectivity measurements to predict interfacial structure

ORAL

Abstract

Determining atomic-scale structure, composition, and electronic properties of interfaces is crucial for technological applications but remains a challenge in liquid environments and under growth conditions. Defect sites on solvated catalyst surfaces change electron energy alignment between the surface and reacting molecules, impacting catalyst performance. Precise control of surface termination during epitaxial growth of novel materials is affected by processes such as dynamic layer rearrangement.

X-ray reflectivity (XRR) experiments probe the electron density of interfaces with high resolution but typically rely on model-dependent fitting to invert the data and obtain the corresponding atomic structure. First principles theory can predict energetically favorable surface structures but depends on approximations which can be inaccurate for defects and nonequilibrium processes. Integrating first principles theory with experimental XRR measurements using global optimization has the potential to determine interfacial structures more accurately than is possible through experiment or theory alone. Using the Al2O3/water interface and the SrTiO3 surface during epitaxial growth as illustrative examples, this presentation explores the challenges and successes of such a combined approach.

Presenters

  • Kendra Letchworth-Weaver

    James Madison University

Authors

  • Kendra Letchworth-Weaver

    James Madison University

  • Katherine Harmon

    Northwestern University

  • Nicholas Cheung

    James Madison University

  • Maria Chan

    Argonne National Laboratory, Center for Nanoscale Materials, Argonne National Laboratory, Materials Research Center, Northwestern University

  • Giulia Galli

    The University of Chicago, Pritzker School of Molecular Engineering, The University of Chicago, Pritzker School of Molecular Engineering, University of Chicago, University of Chicago, Department of Chemistry, University of Chicago, Materials Science Division and Center for Molecular Engineering, Argonne National Laboratory

  • Dillon D Fong

    Argonne National Laboratory, Materials Science Division, Argonne National Laboratory, Materials Science Division, Argonne National Laboratory, Lemont, IL, 60439, USA, Materials Science Division, Argonne National Lab

  • Paul Fenter

    Argonne National Laboratory, Chemical Sciences and Engineering Division, Argonne National Lab.