APS Logo

Block copolymer-metal oxide nanocomposite via sequential infiltration synthesis

ORAL

Abstract

Sequential infiltration synthesis (SIS) is an emerging method for growth of inorganic materials within polymers using atomic layer deposition chemistry. In SIS, vapor precursors diffuse into the polymer volume and interact with polymer moieties, forming hybrid organic-inorganic materials at the molecular level. We shed light on the dynamics and thermodynamics of AlOx and ZnO SIS in polymethyl methacrylate (PMMA), poly 2-vinylpiridine (P2VP) and their corresponding polystyrenes block copolymers using quantum mechanical calculations, microgravimetric measurements and high-resolution electron microscopy. We demonstrate block copolymer-metal oxide nanocomposite utilization in patterning, porous particle fabrication and tuned mechanical properties.

Presenters

  • Tamar Segal-Peretz

    Chemical Engineering, Israel Institute of Technology, Technion - Israel Institute of Technology, Department of Chemical Engineering, Technion, Haifa, Israel

Authors

  • Tamar Segal-Peretz

    Chemical Engineering, Israel Institute of Technology, Technion - Israel Institute of Technology, Department of Chemical Engineering, Technion, Haifa, Israel