APS Logo

Fluence dependent structural changes in photoexcited NdNiO<sub>3</sub> thin films

ORAL

Abstract

Rare earth nickelates display metal-insulator transition which is accompanied by a magnetic transition, charge ordering, and a crystal structure change from orthorhombic to monoclinic. Laser-induced excitation drives the transition at ultrafast timescales and can be used in combination with time resolved x-ray diffraction to disentangle the contribution of competing degrees of freedom. In this study, we focused on measuring the laser fluence dependent photoinduced structural response of epitaxial NdNiO3/ SrTiO3 thin films(NNO/STO) of 9 nm and 19 nm thickness. We utilized time-resolved x-ray diffraction to observe the evolution of the out of plane (002)pc Bragg peak and the in-plane (1-13)/2pc Bragg peak of NNO after laser excitation. Our measurement shows a contraction of the out of plane lattice parameter for low fluences and expansion for high fluences after laser excitation. The observed sign reversal of the peak shift requires a fluence threshold in the range of 1.8-2.4 mJ/cm2 for both films. We observe a thermally inaccessible state for higher laser fluences which recovers with a time constant of 200 ps.

Presenters

  • Jugal Mehta

    University of California, Davis

Authors

  • Jugal Mehta

    University of California, Davis

  • Jianheng Li

    University of California, Davis, Materials Science and Engineering, University of California, Davis

  • Scott Smith

    University of California, Davis

  • Rahul Jangid

    University of California, Davis, Materials Science and Engineering, University of California, Davis

  • Nadia Albayati

    University of California, Davis

  • Kenneth Ainslie

    University of California, Davis, Materials Science and Engineering, University of California, Davis

  • Donald A Walko

    Argonne National Laboratory

  • Haidan Wen

    argonne national laboratory, Argonne National Laboratory

  • Roopali Kukreja

    University of California, Davis, Materials Science and Engineering, University of California, Davis