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Designing a New Lattice Model to Simulate Low-Molecular-Weight Block Copolymers for Nanolithographic Applications

ORAL

Abstract

A new lattice model is designed to be suitable for simulating low-molecular-weight block copolymer (BCP) melts currently used in experiments to achieve sub-10nm domain sizes (i.e., having an invariant degree of polymerization between 102 and 103). It gives an isothermal compressibility comparable to real polymers such as poly(styrene) and poly(methyl methacrylate), high Monte Carlo simulation efficiency, and the fluctuation effects important for the low-molecular-weight BCPs. With its high lattice coordination number, the model can also be readily used for branched chains such as star BCPs. When the Shaffer’s method of preventing bond-crossing (J. Chem. Phys. 1994, 101, 4205) is implemented, it can further be used to study simultaneously the static and dynamic properties of low-molecular-weight BCPs needed for nanolithography.

Presenters

  • Jiaping Wu

    School of Physics, NanKai University, School of Physics, Nankai University

Authors

  • Jiaping Wu

    School of Physics, NanKai University, School of Physics, Nankai University

  • Baohui Li

    School of Physics, Nankai University, School of Physics, NanKai University

  • Qiang Wang

    School of Advanced Materials Discovery, and School of Biomedical Engineering Colorado State University, Colorado State University, School of Advanced Material Discovery, and School of Biological Engineering Colorado State University, Chemical and Biological Engineering, Colorado State University, Department of Chemical and Biological Engineering, School of Advaced Materials Discovery, and School of Biomedical Engineering, colorado state university