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High Performance Avalanche Photodiodes from Bi<sub>2</sub>O<sub>2</sub>Se

ORAL

Abstract

Layered semiconductors consisting of van der Waals and non-van der Waals stacking promise high-performance optoelectronics due to their high mobility, strong light-matter interaction, gate-tunability, and strong in-plane and valley anisotropy. Here, we present metal-semiconductor-metal avalanche photodiodes (APDs) fabricated from layered Bi2O2Se crystals, which consist of alternating [Bi2O2]2+ and [Se]2- layers that are held together by electrostatic interactions. An efficient inverse Auger process yields an intrinsic carrier multiplication factor up to 400 at 7 K under optical excitation at a wavelength of 515.6 nm, resulting in photodiodes with a responsivity gain in excess of 3,000 A/W at a bandwidth of ~400 kHz. Furthermore, exceptionally low dark currents (200 pA) result in high detectivities as high as 4.6 x 1014 Jones. The physics that underlies this superlative performance is elucidated by the temperature and bias dependence of carrier multiplication in reverse-biased Schottky diodes (barrier ≈ 44 meV) with InSe deformation potential of 27 – 33 eV. In contrast with charge trap-based extrinsic gain in phototransistors, the intrinsic gain in Bi2O2Se APDs paves the way for high-speed and low-noise photodetectors.

Presenters

  • Vinod Sangwan

    Department of Materials Science and Engineering, Northwestern University

Authors

  • Vinod Sangwan

    Department of Materials Science and Engineering, Northwestern University

  • Joohoon Kang

    Department of Materials Science and Engineering, Northwestern University

  • Jan Luxa

    Department of Inorganic Chemistry, University of Chemistry and Technology Prague

  • James Male

    Department of Materials Science and Engineering, Northwestern University

  • Jeff Snyder

    Department of Materials Science and Engineering, Northwestern University

  • Zdenek Sofer

    Department of Inorganic Chemistry, University of Chemistry and Technology Prague

  • Mark C Hersam

    Northwestern University, Department of Materials Science and Engineering, Northwestern University