Simulation of Nonlinear Lithography Process

A detailed numerical simulation of a proposed high-resolution nonlinear lithographic system was performed. The process can create arbitrary 2-D patterns at a resolution better than the traditional Rayleigh limit as was shown in the simulation. The simulation is based on realistic material properties and accounts for diffraction and other experimental limitations. Results of the simulation will be presented, along with discussion of how experimental verification of the process can be performed in a subsequent phase of the research.