Topological Surface State Evolution in Chemical Etching of Bi<sub>2</sub>Se<sub>3</sub>
ORAL
Abstract
Key Words: Bi2Se3, ARPES, surface etching
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Presenters
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Ruohan Wang
Department of Physics and Astronomy, Rice Univ
Authors
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Ruohan Wang
Department of Physics and Astronomy, Rice Univ
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Yusheng Hou
Department of Physics and Astronomy, University of California, Irvine
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Hongtao Rong
Institute of Physics, Chinese Academy of Sciences
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Han Wu
Department of Physics and Astronomy, Rice University, Department of Physics and Astronomy, Rice Univ, Department of Physics and Astronomy and Rice Center for Quantum Materials, Rice Univ
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Yucheng Guo
Department of Physics and Astronomy, Rice University, Department of Physics and Astronomy, Rice Univ
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Yichen Zhang
Department of Physics and Astronomy, Rice University, Department of Physics and Astronomy, Rice Univ
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Ruqian Wu
Department of Physics and Astronomy, University of California, Irvine, Physics and Astronomy, University of California Irvine, University of California, Irvine
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Jianwei Huang
Department of Physics and Astronomy, Rice University, Department of Physics and Astronomy, Rice Univ, Department of Physics and Astronomy and Rice Center for Quantum Materials, Rice Univ
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Ming Yi
Rice University, Rice Univ, Department of Physics and Astronomy, Rice University, Department of Physics and Astronomy, Rice Univ, Department of Physics and Astronomy and Rice Center for Quantum Materials, Rice Univ