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Sizable Band Gap in Epitaxial Bilayer Graphene Induced by Silicene Intercalation

ORAL

Abstract

Absence of a band gap in monolayer graphene is a big obstacle to its utilization in silicon electronics. With one more graphene layer added, however, bilayer graphene (BLG) provides a non-zero band gap by breaking the inversion symmetry. Opening a sizable band gap in BLG is of significance for potential applications in graphene-based electronic and photonic devices. Here, we report the generation of a sizable band gap in BLG by intercalating silicene between BLG and Ru substrate. We first grow high-quality Bernal-stacked BLG on Ru(0001) and then intercalate silicene to the interface between the BLG and Ru, which is confirmed by low-energy electron diffraction and scanning tunneling microscopy. Raman spectroscopy shows that the G and 2D peaks of the intercalated BLG are restored to the freestanding-BLG features. Angle-resolved photoelectron spectroscopy measurements show that a band gap of about 0.2 eV opens in the BLG. Density functional theory calculations indicate that the large-gap opening results from a cooperative contribution of the doping and rippling/strain in the BLG. This work provides insightful understanding on the mechanism of band-gap opening in BLG and enhances the potential of graphene-based device development.

Presenters

  • Hui Guo

    Chinese Academy of Sciences,Institute of Physics

Authors

  • Hui Guo

    Chinese Academy of Sciences,Institute of Physics

  • Ruizi Zhang

    Chinese Academy of Sciences,Institute of Physics

  • Hang Li

    Chinese Academy of Sciences,Institute of Physics

  • Hong Ding

    Chinese Academy of Sciences,Institute of Physics, Institute of Physics, Chinese Academy of Sciences, Chinese Academy of Sciences

  • Shixuan Du

    Chinese Academy of Sciences,Institute of Physics, Institute of Physics and University of Chinese Academy of Sciences, Chinese Academy of Sciences, Beijing 100190, China, School of physical sciences, Institute of Physics and University of Chinese Academy of Sciences, Institute of Physics, Chinese Academy of Sciences, Chinese Academy of Science, Chinese Academy of Sciences, Institute of Physics, Institute of Physics & University of Chinese Academy of Sciences, Chinese Academy of Sciences

  • Sokrates T Pantelides

    Department of Physics and Engineering, Vanderbilt University, Department of Physics and Astronomy, Vanderbilt Univ, Department of Physics and Astronomy, Vanderbilt University, Vanderbilt Univ, Department of Physics and Astronomy, Vanderbilt University, Nashville, TN 37235, USA, Institute of Physics, Chinese Academy of Sciences, Department of Physics and Astronomy & Department of Electrical Engineering and Computer Science, Vanderbilt University, Department of Physics and Astronomy and Department of Electrical Engineering and Computer Science, Vanderbilt University, Nashville, TN, Department of Electrical Engineering and Computer Science, Vanderbilt University, Department of Physics and Astronomy and Department of Electrical Engineering and Computer Science, Vanderbilt University, Vanderbilt University

  • Hongjun Gao

    Chinese Academy of Sciences,Institute of Physics, Institute of Physics, Chinese Academy of Sciences, Chinese Academy of Sciences, Institute of Physics