Electric field induced charge trapping/detrapping in SrTiO<sub>3</sub> based two dimensional electron gas
ORAL
Abstract
The choice of electrostatic gating over the conventional chemical doping is attributed to the fact that the former can reversibly tune the carrier density without affecting the system’s level of disorder. However, this proposition seems to break down in field-effect transistors involving SrTiO3 (STO) based two-dimensional electron gases. Such peculiar behavior is associated with the electron trapping under the external electric field. However, the microscopic nature of trapping centers remains an open question. Our work on the conducting interface between defect spinel oxide γ- Al2O3 and cubic perovskite STO reveals that the charge trapping under +ve back gate voltage (Vg) above the tetragonal to cubic structural transition temperature (Tc) of STO is contributed by the electric field-assisted thermal escape of electrons from the quantum well, and the clustering of oxygen vacancies (OVs). Interestingly, an additional source of trapping emerges below Tc, which arises from the trapping of free carriers at the ferroelastic twin walls of STO. Application of -ve Vg results in a charge detrapping from the twin wall, which also vanishes above Tc. The amount of trapped/detrapped charges at the twin wall is controlled by the net polarity of the wall and scales almost linearly with Vg.
–
Presenters
-
Shashank Ojha
Indian Institute of Science Bangalore, Indian Institute of Science
Authors
-
Shashank Ojha
Indian Institute of Science Bangalore, Indian Institute of Science
-
Sankalpa Hazra
Indian Institute of Science
-
Prithwijit Mandal
Indian Institute of Science Bangalore, Indian Institute of Science
-
RANJAN PATEL
Indian Institute of Science Bangalore, Indian Institute of Science
-
Shivam Nigam
Indian Institute of Science
-
Siddharth Kumar
Indian Institute of Science Bangalore, Indian Institute of Science
-
Srimanta Middey
Indian Institute of Science Bangalore, Indian Institute of Science