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Topological Singularity Induced Chiral Kohn Anomaly in a Weyl Semimetal

ORAL

Abstract

The way electrons interact with phonons determines many physical processes that occur within electronic devices and material systems, but it has been difficult to investigate due to the weak strength of the electron-phonon interaction (EPI). An unusual kind of EPI is the Kohn anomaly, first discovered in the 1950s, whereby phonon softening is observed due to the divergence of the electron screening. This has been previously observed in several material systems, ranging from elemental metals to carbon-based allotropes, but not yet in topological materials whose topology imparts an inherent robustness against perturbations. In this talk, I will describe the observation of a chiral Kohn anomaly in the Weyl semimetal tantalum phosphide using inelastic x-ray and neutron scattering, which were guided upon by theoretical calculations [1]. In particular, the strong agreement between theory and calculations related to the unique features of Kohn anomalies in this topological material can help shed light on the strength of the EPI and on fundamental processes that would underlie some of these exotic materials.

[1] Nguyen, T. et al. Phys. Rev. Lett. 124, 236401 (2020).

Presenters

  • Thanh Nguyen

    Nuclear Science and Engineering, Massachusetts Institute of Technology, Massachusetts Institute of Technology

Authors

  • Thanh Nguyen

    Nuclear Science and Engineering, Massachusetts Institute of Technology, Massachusetts Institute of Technology

  • Mingda Li

    Nuclear Science and Engineering, Massachusetts Institute of Technology, Massachusetts Institute of Technology, Massachusetts Institute of Technology MIT

  • Fei Han

    Nuclear Science and Engineering, Massachusetts Institute of Technology, Massachusetts Institute of Technology

  • Nina Andrejevic

    Nuclear Science and Engineering, Massachusetts Institute of Technology, Massachusetts Institute of Technology

  • Ricardo Pablo Pedro

    Massachusetts Institute of Technology

  • Anuj Apte

    Massachusetts Institute of Technology

  • Yoichiro Tsurimaki

    Massachusetts Institute of Technology

  • Zhiwei Ding

    Massachusetts Institute of Technology

  • Kunyan Zhang

    The Pennsylvania State University, Pennsylvania State University

  • Shengxi Huang

    Pennsylvania State University, Penn State University, The Pennsylvania State University

  • Ahmet Alatas

    Advanced Photon Source, Argonne National Laboratory, Argonne National Laboratory, APS, Argonne National Laboratory

  • Esen Alp

    Advanced Photon Source, Argonne National Laboratory, Argonne National Laboratory

  • Songxue Chi

    Oak Ridge National Lab, Oak Ridge National Laboratory

  • Jaime Fernandez-Baca

    Oak Ridge National Lab, Oak Ridge National Laboratory

  • Masaaki Matsuda

    Oak Ridge National Laboratory, Oak Ridge National Lab, Neutron Scattering Division, Oak Ridge National Laboratory, Neutron Scattering Division, Oak Ridge National Laboratory, Oak Ridge, TN 37831, USA

  • David A Tennant

    Oak Ridge National Lab, Oak Ridge National Laboratory

  • Yang Zhao

    NIST Center for Neutron Research,, National Institute of Standards and Technology, NIST Center for Neutron Research, National Institute of Standards and Technology, National Institute of Standard and Technology, Center for Neutron Research, National Institute of Standards and Technology, National Institute of Standards and Technology

  • Zhijun Xu

    National Institute of Standards and Technology, NIST and University of Maryland, NIST Center for Neutron research, National Institute of Standards and Technology, NIST Center for Neutron Research, University of Maryland, NIST Center for Neutron Research, NIST

  • Jeffrey W Lynn

    Center for Neutron Research, National Institute of Standards and Technology, NIST Center for Neutron Research, National Institute of Standards and Technology, Quantum Materials Center, University of Maryland, College Park, NIST Center for Neutron Research, National Institute of Standards and Technology