AFM Additive Nanopatterning on Ionic Liquid Monolayer-Decorated Surfaces by Combined Mechanical and Electrical Stimuli

The development of direct-write nanopatterning approaches enabling the accurate and reliable production of nanoscale architecture is critical for exploiting the unique functionalities of materials at reduced length scales. In the last few decades, several atomic force microscopy (AFM) lithography techniques, which use a sharp probe to write on a solid surface, have been developed as cost-effective methods for patterning with nanoscale resolution. Common AFM lithography techniques usually exploit the meniscus formed around the tip-substrate contact to dissolve and transfer the reactants for surface patterning. This mechanism can be problematic in large scale production due to the restricted ink capacity, as well as the inconsistency in the transfer process by varying experimental and environmental factors. Here we highlight a new AFM patterning method with which an adsorbed ionic liquid (IL) monolayer on the substrate will be used as the ink material. The unique interfacial properties of ILs combined with electrical and mechanical stimuli can realize nanoscale patterning without the reliance of the meniscus for ink transfer. The chemical nature and physical properties of the deposited material will be evaluated.