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Mechanically-Robust and High-Performance Thin Film Transistors with Regioregular-<i>block</i>-Regiorandom Poly(3-hexylthiophene) Copolymers

ORAL

Abstract

We develop mechanically-robust and high-performance organic thin film transistors (OTFTs) based on poly(3-hexylthiophene) (P3HT) regioblock copolymers (block-P3HTs). These block-P3HTs consist of regioregular (rre) and regiorandom (rra) P3HTs, where the crystalline rre block allows efficient charge transport while the amorphous rra block provides mechanical robustness and inter-domain connection. A series of block-P3HTs, having different molecular weight (Mn) of rra blocks with fixed Mn of rre blocks, are prepared and they all exhibit high hole mobility due to the formation of well-developed edge-on crystallites. In addition, mechanical robustness of block-P3HT thin films is remarkably enhanced with the longer rra block, finally leading to 30.2% of elongation at break, which is 100 times higher than rre P3HT homopolymer. In particular, the noticeable enhancement of both elongation at break and toughness is observed between the Mn of rra block, 8 and 20 kg mol-1, indicating that the critical molecular weight of rra P3HT plays an important role in mechanical response of the block-P3HT thin films. This study provides good strategies for high-performance soft electronics to improve the mechanical properties of electroactive materials without disruption of optoelectrical properties.

Presenters

  • Hyeonjung Park

    KAIST

Authors

  • Hyeonjung Park

    KAIST

  • Boo Soo Ma

    KAIST

  • Jin-Seong Kim

    KAIST

  • Youngkwon Kim

    KAIST

  • Hyeong Jun Kim

    University of Massachusetts, Amherst, Univ of Mass - Amherst

  • Donguk Kim

    KAIST

  • Hongseok Yun

    KAIST

  • Junghun Han

    KAIST

  • Felix Sunjoo Kim

    Chung-Ang University (CAU)

  • Taek-Soo Kim

    KAIST

  • Bumjoon Kim

    KAIST