Efficient bias-driven magnetization control by orbital selection at a La<sub>0.67</sub>Sr<sub>0.33</sub>MnO<sub>3</sub> interface
Invited
Abstract
The studied MTJs are grown on an STO (001) substrate by molecular beam epitaxy. We probe the orbital symmetry of the carriers and the MA of the LSMO layers at each bias V by measuring the magnetic-field-direction dependence of the tunneling conductance and that of the tunneling magnetoresistance (TMR), respectively. Using this approach, we show that, with applying V, the MA of the LSMO switches from a two-fold symmetry to a four-fold symmetry by shifting EF from the eg band to the t2g band [1]. This change of MA is strong enough to rotate the magnetization direction from [110] to [1-10] without any assisting magnetic field. Our findings indicate that highly efficient magnetization control can be realized by designing materials so that the EF lies close to the band edges of different-symmetry orbitals [2].
[1] L. D. Anh et al., Sci. Rep. 7, 8715 (2017). [2] L. D. Anh et al., Phys. Rev. Applied. 12, 041001 (2019).
–
Presenters
-
Le Duc Anh
Univ of Tokyo, Department of Electrical Engineering and Information Systems, The University of Tokyo, Institute of Engineering Innovation, The University of Tokyo
Authors
-
Le Duc Anh
Univ of Tokyo, Department of Electrical Engineering and Information Systems, The University of Tokyo, Institute of Engineering Innovation, The University of Tokyo
-
Takashi Yamashita
Univ of Tokyo
-
Noboru Okamoto
Univ of Tokyo
-
Hiroki Yamasaki
Univ of Tokyo
-
Daisei Araki
Univ of Tokyo, Department of Electrical Engineering and Information Systems, The University of Tokyo
-
Munetoshi Seki
Univ of Tokyo, Department of Electrical Engineering and Information Systems, The University of Tokyo
-
Hitoshi Tabata
Univ of Tokyo, Department of Electrical Engineering and Information Systems, The University of Tokyo
-
Masaaki Tanaka
Univ of Tokyo, Department of Electrical Engineering and Information Systems, The University of Tokyo
-
Shinobu Ohya
Univ of Tokyo, Department of Electrical Engineering and Information Systems, The University of Tokyo, Institute of Engineering Innovation, The University of Tokyo