Enabling Novel Approach to a controlled Fabrication of Freestanding Nanomaterials using Two Direct-Writing Technologies

Owing to their unique properties, nanoscale materials, such as nanotubes, nanowires, and 2D layered nanomaterials are emerging as key building blocks of the next generation technologies. Practical implementation of such nanomaterials necessitates their successful incorporation with well-established processes for fabrication of electrical and mechanical devices, often integrated with silicon microstructures. Typically, nanomaterials are synthesized on host substrates and transferred onto the target substrates or devices. In this work, we combine mask–free “direct-write patterning” (DWP) approach for synthesis of nanomaterials at desired locations, and the direct laser writing (DLW) technique, which is based on 2-photon polymerization, to allow for the fabrication of micro-bridge structures with sub-micrometer resolution and nanolithographic patterning of catalysts for in-situ growth of nanoscale 1D or 2D materials. We will discuss our recent results on controlled preparation of 1D and 2D nanostructures with desired morphology using DWP and DLW, as well as the characterization data from Raman, AFM, and SEM measurements. Acknowledgement. A portion of this research was conducted at the ONRL Center for Nanophase Materials Sciences, which is a DOE Office of Science User Facility.