APS Logo

An ultra-high vacuum system for fabricating 2D material devices

ORAL

Abstract

Atomically thin two-dimensional (2D) materials exhibit a rich set of electronic properties that may impact future electronic and optoelectronic applications. Many 2D materials, however, are prone to degradation in the presence of trace amount of oxygen or water vapor. The study of the intrinsic properties of these 2D materials requires protection from degradation agents during sample fabrication process. To this end, we design and build an ultra-high vacuum (UHV) system, in which the entire sample fabrication is performed under a base pressure lower than 5×10-10 mbar. We demonstrate the functionality of this UHV fabrication system by fabricating black phosphorus heterostructures completed with electrical contacts and gate electrode for transport measurements.

–

Presenters

  • Shuaifei Guo

    Fudan University

Authors

  • Shuaifei Guo

    Fudan University

  • Satoru Masubuchi

    University of Tokyo, IIS, Univ of Tokyo

  • Nai Zhou Wang

    University of Science and Technology of China

  • Kenji Watanabe

    National Institute for Materials Science, Japan, National Institute for Material Science, National Institute for Materials Science, National Institute for Materials Science, Tsukuba, Research Center for Functional Materials, NIMS, nims, Advanced Materials Laboratory, National Institute for Materials Science, National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-0044, Japan, NIMS, National Institute for Material Science - Japan, NIMS Tsukuba, National Institute for Materials Science, Namiki 1-1, Ibaraki 305-0044, Japan., National Institute for Materials Science (NIMS), National Institute for Materials Science,Tsukuba, Ibaraki 305-0047, Japan, Advanced Materials Laboratory, NIMS, Japan, National Institute for Materials Science,1-1 Namiki, Tsukuba, 305-0044, Japan, National Institute of Materials Science, National Institute for Materials Science, University of Tsukuba, National Institute for Materials Science, Tsukuba, Japan, National Institute for Material Science, Japan, National Institue for Material Science, Tsukuba, Advanced Materials Laboratory, NIMS, Advanced Materials Laboratory, National Institute for Materials Science, Tsukuba 305-0044, Japan, Advanced Matrials Lab, NIMS, National Institute for Material Science, Tsukuba, Japan, National institute for materials science, NIMS-Tsukuba, NIMS, Japan, National Institute for Materials Science, Namiki Tsukuba Ibaraki, Japan, NIRM, Advanced Materials Laboratory, National Institute for Materials Science, Tsukuba, Japan, NIMS Japan, National Institute for Materials Science, Tsukuba, Ibaraki 305-0044, Japan, Research Center for Functional Materials, National Institute for Materials Science, Tsukuba, Ibaraki, Japan, Advanced Materials Laboratory, National Institute of Materials Science, Advanced Materials Laboratory, National Institute for Materials Science 1-1 Namiki, Tsukuba, 305-0044, Japan, National Institute of Material Science, 1-1 Namiki, Tsukuba 305-0044, Japan, National Institute for Material Science (Japan), Physics, NIMS, National Institute of Materials Science, Japan, National Institute of Materials Science (NIMS), National Institute of Materials Science, Tsukuba, Ibaraki 305-0044, Japan, NIMS - Tsukuba

  • Takashi Taniguchi

    National Institute for Materials Science, National Institute for Material Science, Japan, National Institute of Material Science in Tsukuba, Kyoto Univ, Chemical Engineering, Kyoto University, Advanced Materials Laboratory, National Institute for Materials Science, National Institute of Materials Science (NIMS), National Institute of Materials Science, Japan, Kyoto University

  • Xianhui Chen

    University of Science and Technology of China, Nanjing University, physics department, University of Science and Technology of China

  • Tomoki Machida

    University of Tokyo, IIS, Univ of Tokyo

  • Yuanbo Zhang

    Fudan University, Fudan Univ