Physical Limits of Marangoni-driven Patterning

Marangoni-driven patterning is a novel technique that harnesses photochemically-applied surface tension gradients to pattern thin polymer films. When heated, the polymer flows away from regions of lower surface tension and into regions of higher surface tension, thereby generating hill-and-valley patterns. This new technique offers potential advantages over traditional patterning methods in creating functional coatings and flexible electronics at the roll-to-roll scale. To understand the full scope of applications this new patterning method could serve, it is necessary to understand the fundamental limits of pattern aspect ratio and pattern periodicity, both key metrics in evaluating pattern quality. Here, we present a model for Marangoni-driven patterning and perform a nonlinear analysis to determine the physical limits of pattern aspect ratio and feature pitch for an equal line-space system.