Arbitrary Super-Resolution Patterns Formed in Quantum Dots

In this research, interference patterns were etched onto quantum nanoparticle thin-film samples using the second harmonic of a nanosecond Nd: YAG laser. By forming one interference pattern on a sample and then phase shifting the beam, we are able to produce patterns with twice the resolution due to the nonlinear nature of the quantum nanoparticles. By using the interferometric method with phase and amplitude masks arbitrary 1-D (with two beams) and 2-D (with four beams) patterns can be formed using this lithographic technique.