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Improve the synaptic performance of resistive switching devices through interface engineering

POSTER

Abstract

Transition metal based resistive switching devices (like HfO2, TiO2) has been shown to be a good candidate for neuromorphic computing for its bio-inspired synaptic properties, however, the non-linear conductance change synaptic behaviour prohibits further improvement due to poor accuracy of neural network training. Here, we provide a way to eliminate the intrinsic non-linearity through electrode-oxide interface engineering, including oxygen profile control and oxide heterostructure stacking, which can improve the neural network training accuracy and shorten the training time.

Presenters

  • Yu Shi

    Electrical and Computer Engineering, University of Waterloo

Authors

  • Yu Shi

    Electrical and Computer Engineering, University of Waterloo

  • Rabiul Islam

    Electrical and Computer Engineering, University of Waterloo

  • Guoxing Miao

    University of Waterloo, Electrical & Computer Engineering, University of Waterloo, Electrical and Computer Engineering, University of Waterloo