Enhancement of magnetoelectric coupling by insertion of Co atomic layer into Fe<sub>3</sub>Si/BaTiO<sub>3</sub>(001) interfaces identified by first-principles calculations
ORAL
Abstract
Magnetoelectric (ME) coupling of Ferromagnetic(FM)/ferroelectric(FE) interfaces is stronger than those of single phase multiferroic materials. Especially, interface ME effect caused by bonding effect between interfacial atoms has been reported in many FM/FE interfaces and observed at room temperature. In this study, we examine interface ME coupling at Fe3Si/Co/BaTiO3 heterostructures by using first-principles calculations based on density functional theory to clarify the influence of atomic-layer insertion on the ME effect. D03-type Fe3Si has only 0.1 % lattice mismatch with tetragonal BaTiO3 (001), and it is considered as promising to emerge the interfacial ME effect. We construct several interface structures and compare the energy of each structure. Comparing the Fe3Si/BaTiO3 interface with the Fe3Si/Co/BaTiO3 interface, it is found that the interface ME effect is greatly increased when Co is inserted. We also clarify the differences in ferroelectric displacement and magnetic properties between Fe3Si/BaTiO3 and Fe3Si/Co/BaTiO3.
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Presenters
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Yasunari Hamazaki
Tokyo Inst of Tech - Yokohama
Authors
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Yasunari Hamazaki
Tokyo Inst of Tech - Yokohama
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Yoshihiro Gohda
Department of Materials Science and Engineering, Tokyo Institute of Technology, Tokyo Inst of Tech - Yokohama