Controlled morphotropic phase transitions by strain doping

ORAL

Abstract

Transitions between rhombohedral and tetragonal phases of ferroelectric oxides are of great interest since the competition of these phases at so called morphotropic phase boundaries (MPB) typically leads to extraordinary physical properties. Utilizing external parameters such as the material’s composition or mechanical pressure has been the standard approach to functionalize these MPBs. Here, we demonstrate that “strain doping” via low-energy He implantation is an alternative, controllable, and highly flexible way to induce morphotropic phase transition in ferroelectric oxide thin films. We show that strain doping of rhombohedral BiFeO$_3$ films leads to a gradual transition to a supertetragonal phase that can be reversibly tuned by controlling the He concentration in the film. The changes in structure are shown to dramatically affect physical properties. We argue that our approach to tailor phase coexistence by strain doping is not limited to BiFeO$_3$ films, but should be widely applicable to ferroelectric thin films with competing morphotropic phases.

Authors

  • Andreas Herklotz

    Oak Ridge National Lab, Oak Ridge, USA

  • Stefania Florina Rus

    National Institute for Research and Development in Electrochemistry and Condensed Matter, Timisoara, Romania

  • Er-Jia Guo

    Quantum Condensed Matter Division, Oak Ridge National Laboratory, Oak Ridge, TN 37831, USA, Oak Ridge National Lab, Oak Ridge, USA

  • Anthony Wong

    Oak Ridge National Lab, Oak Ridge, USA

  • Nina Balke

    Oak Ridge National Lab, Oak Ridge, USA

  • T. Zac Ward

    Oak Ridge National Lab, Oak Ridge, USA, Oak Ridge National Laboratory