Van der Waals Engineering of Ferromagnetic Semiconductor Heterostructures for Spin and Valleytronics

ORAL

Abstract

Monolayer transition metal dichalcogenides host easily accessible spin and valley degrees of freedom that can be used to encode and process information. With the advent of van der Waals heterostructures, there are new opportunities to engineer spin and valleytronic devices with more advanced functionalities. In this talk, we will describe a van der Waals heterostructure composed of a monolayer semiconductor, WSe2, and an ultrathin layered ferromagnetic semiconductor, CrI3. The integration of the two materials enables a strong magnetic proximity effect in WSe2 and spin-selective charge transfer from WSe2 to CrI3. Our photoluminescence measurements reveal large valley splitting at zero applied magnetic field, as well as rapid switching of WSe2 valley splitting and polarization within small changes of the applied magnetic field. Moreover, the photoluminescence detection of WSe2 valley pseudospin provides us with a simple yet powerful tool to probe the magnetization dynamics in the ultrathin CrI3.

Authors

  • Ding Zhong

    University of Washington

  • Kyle Seyler

    Univ of Washington, University of Washington

  • Xiayu Linpeng

    University of Washington

  • Ran Cheng

    Carnegie Mellon University

  • Nikhil Sivadas

    Carnegie Mellon University

  • Bevin Huang

    Univ of Washington, University of Washington

  • Emma Schmidgall

    Univ of Washington, University of Washington

  • Takashi Taniguchi

    National Institute for Materials Science, 1-1 Namiki, Tsukuba, Ibaraki, 305-0044 JAPAN, National Institute for Material Science, Japan, National Institute for Materials Science, National Institute for Materials Science, Japan, Advanced materials laboratory, National institute for Materials Science, Tsukuba, Ibaraki, 305-0044, Japan, NIMS, Tsukuba, Japan

  • Kenji Watanabe

    National Institute for Materials Science, 1-1 Namiki, Tsukuba, Ibaraki, 305-0044 JAPAN, National Institute for Material Science, Japan, National Institute for Materials Science, National Institute for Materials Science, Japan, Advanced materials laboratory, National institute for Materials Science, Tsukuba, Ibaraki, 305-0044, Japan, NIMS, Tsukuba, Japan

  • Michael McGuire

    Oak Ridge National Laboratory, Oak Ridge National Lab

  • Wang Yao

    University of Hong Kong, University of Hong Kong, Hong Kong, China

  • Di Xiao

    Carnegie Mellon University, Carnegie Mellon Univ, Department of Physics, Carnegie Mellon University, Department of Physics, Carnegie Mellon University, Pittsburgh, Pennsylvania 15213, USA

  • Kai-Mei Fu

    University of Washington

  • Xiaodong Xu

    University of Washington