Direct observation of PMMA removal from graphene surface

ORAL

Abstract

PMMA is often used as a carrier layer for transfer of CVD graphene from copper to other substrates. After transfer, the PMMA is removed by chemical or thermal treatment. However, regardless of the method used, polymer residues are left on the graphene surface, which degrade the performance of graphene-based devices. Here, we present a systematic study of PMMA removal after graphene transfer. Raman and FET measurements were applied to monitor the polymer dissolution in an acetone bath. Isotope labeling and in-situ TOF-SIMS, XPS, Raman and AFM all show chemical changes in surface residues upon vacuum annealing. These data along with strategies to clean the graphene surface will be presented.

Authors

  • Xiaohan Wang

    Univ of Texas, Austin

  • Harry Chou

    Univ of Texas, Austin

  • Li Tao

    Univ of Texas, Austin

  • Andrew Dick

    Univ of Texas, Austin

  • Andrei Dolocan

    Univ of Texas, Austin

  • Deji Akinwande

    The University of Texas - Austin, Department of Electrical and Computer Engineering, Microelectronics Research Center, University of Texas at Austin, Univ of Texas, Austin

  • C. Grant Willson

    Univ of Texas, Austin