Influence of Oxygen Pressure during Deposition on Atomic-Scale Surface Features of La$_{5/8}$Ca$_{3/8}$MnO$_{3}$ Films
ORAL
Abstract
We have used \textit{in situ} scanning tunneling microscopy to visualize atomic-scale surface structure of a mixed-valence manganite La$_{5/8}$Ca$_{3/8}$MnO$_{3}$ films grown by pulsed laser deposition. Surface termination and chemical composition were identified \textit{in situ} with angle-resolved x-ray photoelectron spectroscopy. We find a strong effect of the background oxygen pressure during deposition on structural and chemical features of the film surface. Deposition at 50 mTorr leads to mixed-terminated films with atomic-scale structurally imperfect B-site (MnO$_{2})$ termination. A small reduction of the pressure from 50 mTorr to 20 mTorr results in a dramatic change of the atomic-scale surface structure. The surface is dominated by nearly perfectly ordered B-site termination. However, this was accompanied by surface roughening at a mesoscopic length scale with formation of mound-like structures. These results can be interpreted as a strong influence of oxygen on the adatom mobility during growth. The effect of the oxygen pressure on dopant surface segregation is also noticeable: Ca surface segregation is reduced with decrease of the oxygen pressure.
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Authors
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A. Tselev
ORNL, Oak Ridge, TN, USA
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R.K. Vasudevan
ORNL, Oak Ridge, TN, USA
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A. Gianfrancesco
ORNL/University of Tennessee Knoxville, TN, USA
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L. Qiao
ORNL, Oak Ridge, TN, USA
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P. Ganesh
CNMS, Oak Ridge National Laboratory, ORNL, Oak Ridge, TN, USA, Oak Ridge National Laboratory, Oak Ridge National Lab, Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Center for Nanophase Materials Sciences, ORNL
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T.L. Meyer
ORNL, Oak Ridge, TN, USA
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Ho Nyung Lee
ORNL, Oak Ridge, TN, USA, Oak Ridge National Laboratory
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M.D. Biegalski
ORNL, Oak Ridge, TN, USA
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A.P. Baddorf
ORNL, Oak Ridge, TN, USA
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S.V. Kalinin
ORNL, Oak Ridge, TN, USA