Raman Characterization of Graphene and 2D TMD Heterostructures
POSTER
Abstract
We report efforts to produce and characterize graphene and two-dimensional transition-metal dichalcogenides (TMD) heterostructures. Using PDMS stamps, exfoliation of graphene, MoS$_{2}$, h-BN, and TaS$_{2}$ precedes the stacking of these mono- and few layers into heterostructures. The goal is to engineer mis-orientation to enhanced Raman signatures of various layers within the heterostructures. Previous studies have reported a Raman signal strength that is angle dependent between bi-layers [1]. Using resonant Raman spectroscopy, we probe the quality of these constructed heterostructures. Ultimately, we plan to combine our optical measurements with an applied magnetic field to probe the complex magneto-Raman interaction. Previous studies [2] show a magneto-phonon resonance at specific field strengths and laser excitations. Our results to date will be summarized.\\[4pt] [1] K. Kwanpyo \textit{et al. }Phys. Rev. Lett. \textbf{108}, 246103 (2012)\\[0pt] [2] C. Qiu \textit{et. al. }Phys. Rev. Lett. \textbf{88, }165407 (2013)
Authors
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Benjamin Derby
American University, National Institute of Standards and Technology
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Angela Hight Walker
National Institute of Standards and Technology, National Institute of Standards and Technology (NIST), Semiconductor and Dimensional Metrology Div, NIST, Gaithersburg, MD, National Institute of Standards and Technology, Gaithersburg, MD 20899, NIST