Interlayer Physics in MoSe$_{2}$/WSe$_{2}$ Heterostructures

ORAL

Abstract

Van der Waals bound heterostructures of atomically thin 2D materials have recently been shown to possess unique properties beyond those of the individual layers. The unique phenomena arising from interactions between vertically stacked layers has generated substantial attention. With direct bandgaps ranging from 1.2 eV to 2.5 eV and strong spin-orbit coupling, monolayer transition metal dichalcogenide based heterostructures provide an intriguing platform for investigating new physics in heterostructure systems. Theoretical studies suggest the possibility of new device applications based on heterostrctures built from these materials, such as optically active bandgap engineering, vertical-tunneling field effect transistors, and new light harvesting technologies. Here, we investigate the interlayer interactions of one such heterostructure configuration, vertically stacked WSe$_{2}$ and MoSe$_{2}$ monolayers, using optoelectronic techniques. Our results suggest that interlayer interactions have significant impacts on exciton physics in the heterostructure. Progress towards understanding the nature of these effects in the MoSe$_{2}$/WSe$_{2}$ heterostructure will be presented.

Authors

  • Pasqual Rivera

    Univ of Washington

  • Hongyi Yu

    Univ of Hong Kong

  • Aaron Jones

    Univ of Washington, University of Washington

  • John Schaibley

    Univ of Washington

  • Jason Ross

    Univ of Washington, univ of washington

  • Sanfeng Wu

    Univ of Washington

  • Grant Aivazian

    Univ of Washington

  • Phillip Klement

    Justus-Liebig-University

  • Nirmal Ghimire

    Univ of Tennessee, Univ of Tennessee Knoxville

  • Jiaqiang Yan

    Department of Materials Science and Engineering, the University of Tennessee, Knoxville, TN 37996, USA, Univ of Tennessee, Univ of Tennessee Knoxville, University of Tennessee, University of Tennessee, Knoxville, and ORNL, Oak Ridge, TN

  • David Mandrus

    Oak Ridge Natl Lab, Department of Materials Science and Engineering, the University of Tennessee, Knoxville, TN 37996, USA, Oak Ridge National Lab, Univ of Tennessee, University of Tennessee and Oak Ridge National Laboratory, Univ of Tennessee Knoxville, University of Tennessee, Oak Ridge National Laboratory

  • Wang Yao

    Univ of Hong Kong

  • Xiaodong Xu

    Univ of Washington, University of Washington, Department of Physics, University of Washington