Thermionic charge transport in CMOS nano-transistors

ORAL

Abstract

We report on DC and microwave electrical transport measurements in silicon-on-insulator CMOS nano-transistors at low and room temperature. At low source-drain voltage, the DC current and AC response show signs of quantization with an additional dependence on back-gate bias. We attribute the quantization to Coulomb blockade resulting from barriers formed under the spacer regions of the chip. We show that at high bias transport occurs thermionic over the highest barrier: Transconductance traces obtained from microwave scattering parameter measurements can be accurately fitted by a thermionic model. From this we deduce the ratio of gate capacitance and quantum capacitance $C_g/C_q = C_{ox}/(C_{ox}+C_q)$, as well as the electron temperature $T_e$. We show that transport in our devices remains thermionic at high bias up to room temperature.

Authors

  • Andreas Betz

    Hitachi Cambridge Laboratory (UK)

  • Fernando Gonzalez-Zalba

    Hitachi Cambridge Laboratory (UK), Hitachi Cambridge Laboratory, Hitachi Cambridge Laboratory, Cavendish Laboratory, UK

  • Sylvain Barraud

    CEA-LETI (France)

  • Quentin Wilmart

    Laboratorie Pierre Aigrain (France)

  • Bernard Placais

    Laboratorie Pierre Aigrain (France)

  • David A. Williams

    Hitachi Cambridge Laboratory (UK)