Theoretical study of disorder induced magnetoresistance in graphene

ORAL

Abstract

In this work we predict theoretically that carrier density inhomogeneity provides a new mechanism for classical magnetoresistance. For concreteness, we study the case of graphene where density inhomogeneity and carrier scattering is dominated by charged impurities, although the mechanism itself is quite general and applies to other systems in which there are large spatial fluctuations of the carrier density. Calculations using an effective medium approximation show that low-field magnetoresistance becomes a universal function of the ratio between the average carrier density and the fluctuations of the carrier density, and scales as a power-law when this ratio is large. Our finding is in excellent agreement with recent experimental results. This work is supported by the Singapore National Research Foundation NRF-NRFF2012-01.

Authors

  • Shaffique Adam

    Yale-NUS College, Singapore and Graphene Research Centre and Department of Physics, National University of Singapore, Yale-NUS College and National University of Singapore

  • Jinglei Ping

    Center for Nanophysics and Advanced Materials, University of Maryland, College Park, University of Maryland

  • Indra Yudhistira

    National University of Singapore

  • Navneeth Ramakrishnan

    National University of Singapore

  • Sungjae Cho

    Univ of Illinois - Urbana, Univeristy of Illinois

  • Michael S. Fuhrer

    School of Phys, Monash Univ, Australia, Monash University and University of Maryland, Monash Univeristy, Australia