Invited Session: Frontiers in Nanomanufacturing: Atomic Scale Metrology, Large Scale Industry Technology Challegnes and Inherent Device Limitations
INVITED · G4
Presentations
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Time-Resolved, Atomic-Resolution Imaging of Metastable Atom Configurations
COFFEE_KLATCH · Invited
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Authors
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Christian Kisielowski
Lawrence Berkeley National Laboratory, Berkeley CA 94720
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TBD
COFFEE_KLATCH · Invited
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Authors
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Thomas Albrecht
HGST, San Jose Research Center
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Scalable fabrication of nanostructured devices on flexible substrates using additive driven self-assembly and nanoimprint lithography
COFFEE_KLATCH · Invited
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Authors
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James Watkins
Polymer Science and Engineering Department at University of Massachusetts Amherst, Department of Polymer Science and Engineering, University of Massachusetts Amherst, University of Massachusetts Amherst, University of Massachusetts
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to be determined
COFFEE_KLATCH · Invited
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Authors
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Asen Asenov
University of Glasgow
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Imagining and Imaging Future Devices: A Physicist's Dream
COFFEE_KLATCH · Invited
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Authors
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Scott List
Intel Corporation
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