Controlling the metal insulator transition using the ferroelectric field effect in rare earth nickelates

ORAL

Abstract

A ferroelectric field effect transistor (FE-FET) modulates conductivity in a non-volatile manner by electrostatically accumulating and depleting charge carriers at the interface between a conducting channel and ferroelectric gate. The rare earth nickelate LaNiO$_{3}$ is metallic in bulk, while other rare earth nickelates, such as NdNiO$_{3}$, exhibit metal-insulator transitions and anti-ferromagnetic behavior in the bulk. Here, we show that by coupling the ferroelectric polarization of Pb$_{0.8}$Zr$_{0.2}$TiO$_{3}$ (PZT) to the carriers in a nickelate, we can dynamically induce a metal- insulator transition in ultra-thin films of LaNiO3, and induce large changes in the MIT transition temperature in NdNiO3. Density functional theory is used to determine changes in the physical and electronic Ni-O-Ni bond angle of the nickelate at the interface between PZT and LaNiO3. The effect of the ferroelectric polarization is to decrease the Ni-O-Ni bond angle from 180 degrees and increase the carrier effective mass. Related to this change in electronic structure, we observe a change in resistivity of approximately 80{\%} at room temperature for an ultra-thin 3 unit cell thick film of LaNiO$_{3}$.

Authors

  • Matthew Marshall

    Yale University, Department of Applied Physics and Center for Research on Interface Structures and Phenomena (CRISP), Yale University

  • Ankit Disa

    Center for Research on Interface Structures and Phenomena and Department of Applied Physics, Yale University, New Haven, CT, Department of Applied Physics and Center for Research on Interface Structures and Phenomena (CRISP), Yale University, Center for Research on Interface Structures and Phenomena and Department of Applied Physics, Yale University

  • Divine Kumah

    Center for Research on Interface Structures and Phenomena and Department of Applied Physics, Yale University, New Haven, CT, Department of Applied Physics and Center for Research on Interface Structures and Phenomena (CRISP), Yale University

  • Hanghui Chen

    Columbia University, Department of Applied Physics and Center for Research on Interface Structures and Phenomena (CRISP), Yale University, Department of Physics, Columbia University

  • Sohrab Ismail-Beigi

    Applied Physics, Yale University, Yale University, Center for Research on Interface Structures and Phenomena and Department of Applied Physics, Yale University, New Haven, CT, Department of Applied Physics and Center for Research on Interface Structures and Phenomena (CRISP), Yale University

  • Fred Walker

    Yale University, Center for Research on Interface Structures and Phenomena and Department of Applied Physics, Yale University, New Haven, CT, Department of Applied Physics and Center for Research on Interface Structures and Phenomena (CRISP), Yale University

  • Charles Ahn

    Yale University, Center for Research on Interface Structures and Phenomena and Department of Applied Physics, Yale University, New Haven, CT, Department of Applied Physics and Center for Research on Interface Structures and Phenomena (CRISP), Yale University