Graphene growth by CVD using liquid precursors

ORAL

Abstract

Chemical vapor deposition (CVD) represents an attractive route to synthesize large-area graphene. Its catalytic growth using metals has been studied in recent years, the most popular being nickel and copper. We have successfully grown graphene on copper by CVD at ambient pressure using alcohols as the carbon feedstock. The produced materials are analyzed by SEM, TEM, Raman spectroscopy and transferred onto Si/SiO$_{2}$ substrates using standard methods. Raman fingerprint of monolayer graphene is present in our samples. This technique represents a safer and more versatile alternative to the production of graphene compared to the synthesis of graphene using methane at low pressure.

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Authors

  • Jessica Campos Delgado

    Universit\'e Catholique de Louvain

  • Andr\'es Rafael Botello-M\'endez

    ICMN, Universit\'e Catholique de Louvain, Belgium, Universit\'e Catholique de Louvain, Institute of Condensed Matter and Nanosciences, Université Catholique de Louvain, Belgium, Institute of Condensed Matter and Nanosciences(IMCN), Universite Catholique de Louvain (UCL), Belgium

  • Benoit Hackens

    Universit\'e Catholique de Louvain

  • J.C. Charlier

    ICMN, Universit\'e Catholique de Louvain, Belgium, Universit\'e Catholique de Louvain, Institute of Condensed Matter and Nanosciences, Universit\'e Catholique de Louvain, Belgium

  • Thomas Pardoen

    Universit\'e Catholique de Louvain

  • Jean-Pierre Raskin

    Universit\'e Catholique de Louvain