Collective Excitations in Ultrathin Magnesium Films on Silicon

ORAL

Abstract

We present a systematic study of plasmon excitation in ultrathin Mg overlayer on Si(111) substrate. Our numerical results qualitatively reproduce the experimentally observed plasmon spectra of the Mg/Si systems [1]. The underlying physics of the formation of various absorption peaks can be understood using the simple hybridization concept. Based on this concept, the coexistence of surface and bulk plasmons in the experimental observation turns out to be a clear evidence for the existence of multiple surface plasmons due to the quantum confinement in Mg thin films [2]. In addition, we clearly see the plasmon enhanced substrate absorption, which comes from the screening of the substrate to the oscillatory charges.\\[4pt] [1] Ao Teng et al.(to be published).\\[0pt] [2] Xiaoguang Li et al.(to be published).

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Authors

  • Xiaoguang Li

    Fudan Univ., Shanghai, China, U of Tennessee, Univ. of Sci. \& Tech. of China, Fudan Univerisity, Shanghai, China, U of Tennessee, U of Sci. \& Tech. of China

  • Di Xiao

    Oak Ridge National Laboratory, Oak Ridge National Lab, Materials Science and Technology Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831

  • Jian Shen

    Fudan University, Fudan Univerisity, Shanghai, China, Department of Physics, Fudan University, Shanghai, China and Department of Physics and Astronomy, The University of Tennessee, University of Tennessee

  • Hanno Weitering

    Department of Physics and Astronomy, The University of Tennessee, U of Tennessee, Oak Ridge National Laboratory

  • Zhenyu Zhang

    University of Science and Technology of China, University of Science and Technology of China, Harvard University, University of Texas at Austin, Department of Physics and Astronomy, University of Tennessee; ICQD, University of Science and Technology of China, Hefei, Anhui, China, U of Sci. \& Tech. of China, Harvard U