QM/EM simulation of Junctionless FinFET

ORAL

Abstract

We present here the simulations of a junctionless transistor. Its source, channel and drain are embeded in a piece of uniformly doped silicon nanowire. In the earlier stage, it has been designed to be a normally ``ON'' device. Quite reversely, the first experimentally presented junctionless transistor is in the ``OFF" state when the applied gate voltage is absent. Simulations show that the depletion occurs between the nanowire and hetero-doped gate. A ``P-N junction'' is formed in the junctionless transistor, whose direction is perpendicular to the direction of the current flowing. Our simulation considers the depletion effect in the Qauntum mechanical calculation. I-V curves of transistors with the gate doped by the same and different type of dopants have been obtained. The results match the experiments.

Authors

  • Jie Peng

    Department of Chemistry,University of Hong Kong, Hong Kong, China

  • Linyi Meng

    Department of Chemistry,University of Hong Kong, Hong Kong, China

  • Chiyung Yam

    Department of Chemistry,University of Hong Kong, Hong Kong, China

  • Guanhua Chen

    Department of Chemistry,University of Hong Kong, Hong Kong, China