Fabrication of High Quality Topological Insulator Thin Films and Heterostructures

ORAL

Abstract

In this talk, I will present a method of fabrication high quality topological insulator thin films and heterostructures with ferromagnet materials using MBE with a RF Selenium cracker cell and pulsed laser deposition. I will also show some preliminary results on the physical properties of those films, including topography, crystal structure and transport properties.

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Authors

  • Li Zhang

    Stanford University

  • Robert Hammond

    Stanford University

  • Merav Dolev

    Stanford University

  • Mac Beasley

    Geballe Laboratory for Advanced Materials, Stanford University, Stanford University

  • Aharon Kapitulnik

    Stanford University