Directed assembly of supramolecular copolymers in thin films

Using computer simulation of a coarse-grained model for supramolecular polymers we investigate the potential of quasi-block copolymers (QBCP) assembled on chemically patterned substrates for creating device-oriented nanostructures. QBCP are comprised of AB diblock copolymers and supramolecular B segments that can reversibly bond to any available B terminus, either on the copolymers or the B oligomers, creating a polydisperse blend of B homopolymers, AB and ABA copolymers. We focus on an AB incompatibility, $\chi$, and strength of supramolecular bonds where a lamellar morphology, a bicontinous structure and a macrophase-separated state have comparable free energy in the bulk. We consider substrate patterns with perpendicularly crossing, A-preferential lines and demonstrate their defect-free replication by QBCP. The same QBCP replicates simultaneously patterns differing by up to $50\%$ in their length scales, illustrating the high versatility of QBCP materials. We discuss the interplay between pattern geometry and distribution of molecular architectures and verify the key role of supramolecular associations for replicating patterns with different length scales.