Imaging Layer Effect on Density Multiplication in the Directed Assembly of Block Copolymer Thin Films

ORAL

Abstract

Recently, we discovered the assembly block copolymer thin films on chemically nanopatterned surfaces markedly improve both the quality and resolution of the lithographic process. In comparing the assembled block copolymer structures to the lithographically defined chemical pattern, the density of features is increased by a factor of four and the dimensional uniformity is vastly improved, even on the strongly preferential background imaging layer. Here, we investigate the effect of the interactions between the patterned imaging layer and the components of the block copolymer, especially polystyrene-\textit{block}-poly(methyl methacrylate) (PS-$b$-PMMA), by controlling the fraction of styrene in the imaging layer of chemically patterned surfaces from preferential to non-preferential to the polymer.

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Authors

  • Huiman Kang

    Department of Chemical and Biological Engineering, University of Wisconsin-Madison, University of Wisconsin

  • Eungnak Han

    Department of Materials Science \& Engineering,University of Wisconsin-Madison, Department of Materials Science and Engineering, University of Wisconsin-Madison

  • Padma Gopalan

    Department of Materials Science and Engineering, University of Wisconsin-Madison

  • Paul F. Nealey

    Department of Chemical \& Biological Engineering, University of Wisconsin-Madison, Department of Chemical and Biological Engineering, University of Wisconsin - Madison, University of Wisconsin, Department of Chemical and Biological Engineering, University of Wisconsin-Madison, Department of Chemical and Biological Engineering,University of Wisconsin-Madison, 1415 Engineering Drive, Madison, WI, 53706