Kelvin Probe Microscopy of Single- and Multi-layer Graphene on SiO$_{2}$.

ORAL

Abstract

Kelvin probe microscopy (KPM) was carried out on mechanically exfoliated graphene samples on SiO$_{2}$ in conjunction with standard atomic force microscopy. Potential differences between the SiO$_{2}$ substrate and graphene flakes were large relative to the average fluctuations over the surface of the graphene. KPM shows a consistent surface potential variation between monolayer, bilayer, and multi-layer graphene, and over folded pleats occasionally found in graphene. The source of these surface potential differences will be discussed.

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Authors

  • Alexandra Curtin

    University of Maryland

  • Theresa Swanson

    Westminster College

  • Michael Fuhrer

    University of Maryland, Department of Physics and Center for Nanophysics and Advanced Materials, University of Maryland College Park, Department of Physics and Center for Nanophysics and Advanced Materials, University of Maryland, College Park, MD 20742, USA, Materials Research Science and Engineering Center, Center for Nanophysics and Advanced Materials, Dept of Physics, Univ. of Maryland, College Park, MD, Materials Research Science and Engineering Center and Center for Nanophysics and Advanced Materials, Department of Physics, University of Maryland, Department of Physics and Center for Nanophysics and Advanced Materials, University of Maryland, College Park, MD 20742-4111, USA