Industrial Advanced Characterizations
INVITED · Y6
Presentations
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Local strain analysis for CMOS technology by Raman and Nano-Raman spectroscopy
COFFEE_KLATCH · Invited
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Authors
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Michael Hecker
AMD Saxony LLC \& Co. KG
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Hydrogen storage by physisorption on Metal Organic Frameworks
COFFEE_KLATCH · Invited
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Authors
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Anne Dailly
General Motors, R\&D center, CES Laboratory
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Characterization of the pore geometry of porous media and the saturating fluids using 2-dimensional diffusion - NMR relaxation measurements
COFFEE_KLATCH · Invited
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Authors
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Martin Dominik Hürlimann
Schlumberger - Doll Research
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Non- linear Optical Spectroscopy of Interfaces
COFFEE_KLATCH · Invited
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Authors
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Mohsen Yaganeh
ExxonMobil Research and Engineering Co., Corporate Strategic Research, Exxon Mobil
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Development of Silicide Contacts for CMOS devices: Advantages of using Synchrotron Radiation
COFFEE_KLATCH · Invited
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Authors
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Christian Lavoie
IBM T.J. Watson Research Center
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