Chemical Deposition and Photoactivity of Anatase and Rutile TiO$_{2}$ Films on Si(111).

Dilute Aqueous Chemical Bath Deposition (CBD) from highly acidic (pH $<$ 1) TiCl3 HCl solutions at room temperature and slightly higher (23$^{\circ}$C - 40$^{\circ}$C) produced thin titanium dioxide films on clean Si(111).~ We report initial results of X-ray Photoelectron Spectroscopy (XPS), Scanning Electron Microscopy (SEM), and X-ray Diffraction (XRD) measurements.~ The films thicknesses varied from 300 nm to $\sim $ 1$\mu $m.~ It was found that the films required annealing to ensure adherence to the Si(111) substrate.~ XRD showed that the anatase and rutile structures were present in the TiO2 as a function of post-deposition annealing temperature.~ Additionally, photo decomposition results of methyl orange and methyl blue on TiO2/Si(111) system under UV light is observed and reported.