Focus Session: Lithography

Presentations

• Nanoimprint Lithography: Process Induced Stresses and Pattern Stability

  COFFEE_KLATCH · Invited

  March 16, 2006, 2:30 PM – March 16, 2006, 3:06 PM

  Authors

  • Christopher L. Soles

    NIST, NIST Polymers Division

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• Nanometer-scale control of the crystallization of oligomers and polymers.

  COFFEE_KLATCH · Invited

  March 16, 2006, 3:06 PM – March 16, 2006, 3:42 PM

  Authors

  • Alain M. Jonas

    Universite catholique de Louvain

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• UV Polarizer Fabricated by Diblock Copolymer Lithography

  ORAL

  March 16, 2006, 3:42 PM – March 16, 2006, 3:54 PM

  Authors

  • Koji Asakawa

  • Vincent Pelletier

  • Mingshaw Wu

  • Douglas H. Adamson

  • Richard A. Register

  • Paul M. Chaikin

    Princeton University

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• Simple Analytic Model for Nanowire Array Polarizers

  ORAL

  March 16, 2006, 3:54 PM – March 16, 2006, 4:06 PM

  Authors

  • Vincent Pelletier

  • Koji Asakawa

  • Mingshaw Wu

  • Richard Register

    Department of Chemical Engineering, Princeton University, Princeton University

  • Paul Chaikin

    Princeton University, New York University

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• Robust Nanopatterns from Self-Assembly of a Diblock Copolymer and an Inorganic Precursor

  ORAL

  March 16, 2006, 4:06 PM – March 16, 2006, 4:18 PM

  Authors

  • Ho-Cheol Kim

  • Linnea Sundstrom

  • Leslie Krupp

  • Eugene Delenia

  • Charles Rettner

  • Martha Sanchez

  • Mark Hart

  • Ying Zhang

    IBM Watson Research Center

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• Fabrication of inorganic photonic crystals from interference lithography

  ORAL

  March 16, 2006, 4:18 PM – March 16, 2006, 4:30 PM

  Authors

  • Jun Hyuk Moon

  • Shu Yang

    Department of Materials Science and Engineering, University of Pennsylvania, Philadelphia, Pennsylvania 19104

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• Effects on Low Voltage Electron Beam Lithography

  ORAL

  March 16, 2006, 4:30 PM – March 16, 2006, 4:42 PM

  Authors

  • Mehdi Bolorizadeh

    EM Facility, University of Tennessee

  • David C. Joy

    Oak Ridge National Laboratory

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• Hierarchical Organization of Nanoparticle Composites through Nano-Imprinting

  ORAL

  March 16, 2006, 4:42 PM – March 16, 2006, 4:54 PM

  Authors

  • Azar Alizadeh

  • Chris Keimel

  • Kenneth Conway

  • Andrea Peters

    GE Global Research, Niskayuna, NY 12309

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• Mesoscale Simulation of the Lithography Process

  ORAL

  March 16, 2006, 4:54 PM – March 16, 2006, 5:06 PM

  Authors

  • Grant Willson

    The University of Texas

  • Gerard Schmid

    Molecular Imprints, Inc Austin, Texas

  • Jason Meiring

    The University of Texas

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• New Directions in 3-D Multiphoton Lithography.

  ORAL

  March 16, 2006, 5:06 PM – March 16, 2006, 5:18 PM

  Authors

  • John Fourkas

    University of Maryland College Park

  • Christopher LaFratta

    University of Maryland

  • Richard Farrer

    Pine Manor College

  • Linjie Li

    University of Maryland

  • Michael Naughton

    Boston College, Dept. of Physics, Boston College

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• High efficient LEDs having columnar structure surface fabricated by block copolymer lithography

  ORAL

  March 16, 2006, 5:18 PM – March 16, 2006, 5:30 PM

  Authors

  • Akira Fujimoto

  • Koji Asakawa

    Corporate Research and Development Center, Toshiba Corporation

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