Scaling behavior of Film growth mechanism
ORAL
Abstract
Experimental evidence has accumulated that a strained film can grow stably on a vicinal surface. Linear perturbation analysis of the step-flow regime results in a dispersion relation which determines the persistence of the step-flow growth. The dispersion relation can also be used to probe the system parameters. Investigating the growth dynamics in the step-bunching regime, we found that there is a critical film thickness above which step-bunching occurs. The critical thickness shows a scaling behavior depending on the terrace width and the deposition flux. Experiments show a qualitative agreement with the theory. Our results may open a way to grow films in a desired way.
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Authors
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Mina Yoon
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H.N. Lee
Oak Ridge National Laboratory
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Zhigang Suo
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Wei Hong
Harvard University
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Hans M. Christen
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D.H. Lowndes
Oak Ridge National Laboratory, Oak Ridge National Laboratory, Oak Ridge, TN, USA
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Zhenyu Zhang
Condensed Matter Sciences Division, Oak Ridge National Lab, Oak Ridge National Laboratory, Oak Ridge National Laboratory \& University of Tennessee, University of Tennessee \& ORNL, Oak Ridge National Lab, Oak Ridge National Lab, University of Tennessee