Optically measured plasma density using Phase Resolved Optical Emission Spectroscopy in low-pressure capacitive discharges
ORAL
Abstract
As plasma applications continue to advance technologically and grow in complexity, precise plasma diagnostics are crucial for optimizing plasma processes. However, diagnosing plasma properties remains both technically and physically challenging, requiring non-intrusive methods that maintain uninterrupted plasma operation while also incorporating a fundamental understanding of plasma physics. In this study, we measure electron density using a non-invasive optical measurement in low-pressure capacitive discharges. This optical approach provides nanosecond time-resolved insights into the dynamics of energetic electrons, particularly the multiple electron beams that are launched into the plasma during a single phase of sheath expansion adjacent to an electrode. As the time interval between two consecutive beams corresponds to the inverse instantaneous electron plasma frequency, the absolute electron density can be determined by measuring this time interval. The measured electron density is found to oscillate within the radio-frequency period under low-pressure discharge conditions. The dynamics of this density oscillation is analyzed using the continuity equation, accounting for the contribution of the electron beams.
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Presenters
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CHANWON PARK
Korea Research Institute of Standards and Science
Authors
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CHANWON PARK
Korea Research Institute of Standards and Science
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Julian Schulze
Chair of Applied Electrodynamics and Plasma Technology, Ruhr University Bochum, Bochum, Germany
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Birk Berger
House of Plasma GmbH
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Gwang-seok Chae
Korea Research Institute of Standards and Science
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Jung-Hyung Kim
Korea Research Institute of Standards and Science
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Hyo-Chang Lee
Korea Aerospace University