Plasma-Surface Interactions II
FOCUS · GR2 · ID: 3429856
Presentations
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Multi-scale Simulations of Ion Energy Effects on Amorphous Silicon (a-Si:H) Film Deposition
ORAL
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Presenters
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Liuqin Song
Dalian University of Technology
Authors
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Liuqin Song
Dalian University of Technology
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Wenzhu Jia
Southwest University
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Wan Dong
Dalian University of Technology, Key Laboratory of Materials Modification by Laser, Ion, and Electron Beams (Ministry of Education), School of Physics, Dalian University of Technology, Dalian
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Yi-Fan Zhang
Dalian University of Technology
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Yuanhong Song
School of Physics, Dalian University of Technology, Dalian, China, Dalian University of Technology, Key Laboratory of Materials Modification by Laser, Ion, and Electron Beams (Ministry of Education), School of Physics, Dalian University of Technology, Dalian
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Plasma-electrochemical cell interaction: a novel approach to study plasma-surface chemical interactions
ORAL
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Presenters
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Richard van de Sanden
Dutch Institute for Fundamental Energy Research (DIFFER), Eindhoven, The Netherlands, DIFFER, Eindhoven, The Netherlands
Authors
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Richard van de Sanden
Dutch Institute for Fundamental Energy Research (DIFFER), Eindhoven, The Netherlands, DIFFER, Eindhoven, The Netherlands
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Xingyu Chen
Dutch Institute of Fundemental Energy Research, Eindhoven, The Netherlands and School of Electrical Engineering, Xi'an Jiaotong University, Xi'an, China
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Aleksandr Pikalev
Dutch Institute for Fundamental Energy Research (DIFFER), Eindhoven, The Netherlands
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Vasco Guerra
Instituto de Plasmas e Fusão Nuclear, Instituto Superior Técnico, Universidade de Lisboa, Instituto de Plasmas e Fusão Nuclear, Instituto Superior Técnico, Lisbon University, Instituto Superior Tecnico
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Michail Tsampas
Dutch Institute for Fundamental Energy Research (DIFFER), Eindhoven, The Netherlands
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Exploring the Impact of Mask Geometries on High Aspect Ratio Silicon Etching Using Cl<sub>2</sub>/O<sub>2</sub> Plasmas
ORAL · Invited
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Presenters
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Xingyi Shi
Applied Materials
Authors
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Xingyi Shi
Applied Materials
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Han Luo
Applied Materials, Inc.
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Shahid Rauf
Applied Materials, Inc.
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Jason Kenney
Applied Materials
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Estimating the O recombination probability in Pyrex from the loss frequency in oxygen-containing plasma
ORAL
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Publication: Submitted to PSST: Assessing the meaning of the atomic oxygen loss frequency and recombination probability in oxygen glow discharges in Pyrex<br>Planned: Estimating the O recombination probability in Pyrex from the loss frequency in CO2 plasma
Presenters
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Pedro Viegas
Instituto de Plasmas e Fusão Nuclear, Instituto Superior Técnico - Universidade de Lisboa, Instituto Superior Técnico - Universidade de Lisboa
Authors
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Pedro Viegas
Instituto de Plasmas e Fusão Nuclear, Instituto Superior Técnico - Universidade de Lisboa, Instituto Superior Técnico - Universidade de Lisboa
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Tiago C Dias
University of Michigan
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Vasco Guerra
Instituto de Plasmas e Fusão Nuclear, Instituto Superior Técnico, Universidade de Lisboa, Instituto de Plasmas e Fusão Nuclear, Instituto Superior Técnico, Lisbon University, Instituto Superior Tecnico
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Plasma Polymerization into 3D Structures
ORAL
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Presenters
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Lenka Zajickova
CEITEC, Brno University of Technology
Authors
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Lenka Zajickova
CEITEC, Brno University of Technology
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David Necas
CEITEC, Brno University of Technology
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Martina Janusova
CEITEC, Brno University of Technology
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Lucie Janu
CEITEC, Brno University of Technology
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Paula Navascués
Empa, Swiss Federal Laboratories for Materials Science and Tecnology
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Dirk Hegemann
Empa, Swiss Federal Laboratory for Materials Science and Technology
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Nicole Rusnakova
Faculty of Science, Masaryk University, Brno
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