Plasma Diagnostics III
FOCUS · ER2 · ID: 3429881
Presentations
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In-line in situ sensing of OH radicals from a remote plasma source using Faraday rotation spectroscopy
ORAL
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Presenters
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Timothy Y Chen
Applied Materials, Inc.
Authors
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Timothy Y Chen
Applied Materials, Inc.
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Brian Alvarez
Applied Materials, Inc.
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Kelvin Chan
Applied Materials
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Dmitry A Dzilno
Applied Materials, Inc.
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Overcoming challenges in laser-induced fluorescence for diagnostics of atomizers for trace element analysis
ORAL · Invited
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Publication: Mrkvičková M. et al., Combustion and Flame 241 (2022), 112100.<br>Dvořák P. et al., Front. Phys. 12 (2024), 1408078. <br>Dvořák, P. et al., J Fluoresc (2025).<br><br>
Presenters
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Martina Mrkvičková
Department of Plasma Physics and Technology, Masaryk University, Brno, Czechia
Authors
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Martina Mrkvičková
Department of Plasma Physics and Technology, Masaryk University, Brno, Czechia
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Pavel Dvořák
Department of Plasma Physics and Technology, Masaryk University, Brno, Czechia
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Tomáš Medek
Department of Plasma Physics and Technology, Masaryk University, Brno, Czechia
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Michal Pazderka
Department of Plasma Physics and Technology, Masaryk University, Brno, Czechia
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Waseem Khan
Department of Plasma Physics and Technology, Masaryk University, Brno, Czechia
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Nima Bolouki
Department of Plasma Physics and Technology, Masaryk University, Brno, Czechia
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Adam Obrusník
Department of Plasma Physics and Technology, Masaryk University, Brno, Czechia
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Milan Svoboda
Institute of Analytical Chemistry of the Czech Academy of Sciences, Brno, Czechia
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Jiří Dědina
Institute of Analytical Chemistry of the Czech Academy of Sciences, Brno, Czechia
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Jan Kratzer
Institute of Analytical Chemistry of the Czech Academy of Sciences, Brno, Czechia
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Analysis of the Transmission Spectrum of the Ceramic-Shielded Cutoff Probe in Low-Pressure Plasma
ORAL
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Publication: D.Y. Hwang, H.J. Yeom, G. Lee, J.H. Kim, and H.C. Lee, "Transmission spectrum analysis of ceramic-shielded microwave cutoff probes in low-pressure plasmas," J. Appl. Phys. 135(22), (2024); doi: 10.1063/5.0214696
Presenters
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Do-Yeon Hwang
Korea Research Institute of Standards and Science
Authors
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Do-Yeon Hwang
Korea Research Institute of Standards and Science
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Hee-Jung Yeom
Korea Research Institute of Standards and Science
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Wooram Kim
Korea Research Institute of Standards and Science
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Gawon Lee Lee
Chungnam National University
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Jung-Hyung Kim
Korea Research Institute of Standards and Science
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Hyo-Chang Lee
Korea Aerospace University
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Measurement of plasma electron density using a non-invasive microwave resonance spectroscopy through a chamber window in a low-pressure plasma
ORAL
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Presenters
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InYong Park
Korea Institute of Machinery and Materials, Semiconfuctor Equipment Research Center, Korea Institute of Machinery and Materials
Authors
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InYong Park
Korea Institute of Machinery and Materials, Semiconfuctor Equipment Research Center, Korea Institute of Machinery and Materials
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SangHo Lee
Korea Institute of Machinery and Materials, Semiconfuctor Equipment Research Center, Korea Institute of Machinery and Materials
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GeonWoong Eom
Semiconfuctor Equipment Research Center, Korea Institute of Machinery and Materials
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WooSeok Kang
Korea Institute of Machinery and Materials, Semiconfuctor Equipment Research Center, Korea Institute of Machinery and Materials
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Min Hur
Korea Institute of Machinery and Materials, Semiconfuctor Equipment Research Center, Korea Institute of Machinery and Materials
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DaeWoong Kim
Korea Institute of Machinery and Materials, Semiconfuctor Equipment Research Center, Korea Institute of Machinery and Materials
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Development of Microwave Patch Antenna Sensor for Plasma Uniformity Monitorin
ORAL
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Presenters
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Gwang-Seok Chae
Korea Aerospace University
Authors
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Gwang-Seok Chae
Korea Aerospace University
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Min Young Yoon
Korea Aerospace University
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Hee-Jung Yeom
Korea Research Institute of Standards and Science
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Eun-Seok Choe
Korea Research Institute of Standards and Science
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Jung-Hyung Kim
Korea Research Institute of Standards and Science
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Hyo-Chang Lee
Korea Aerospace University
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