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Advanced Non-equilibrium Cold Plasma Technologies for Water Purification

ORAL · Invited

Abstract

Ultraviolet (UV) light is highly effective in inactivating microorganisms and treating water contaminants [1]. Among UV spectral bands, UV-C (200–280 nm) is particularly effective due to its strong DNA absorption and potential for generating hydroxyl radicals (•OH) in advanced oxidation processes (AOPs). Industrial wastewater, especially from the textile and medical sectors, contains persistent azo dyes and organic micropollutants (OMPs), posing severe environmental risks. In recent developments, dielectric barrier discharge (DBD) plasma-based excilamps emitting far UV-C (KrCl*, 222 nm) and broad UV-C (XeI*, 253 nm) have been designed, developed and optimized for water treatment [2-4]. Electrical and optical characterizations ensured application-specific efficiency. These excilamps, applied via direct photolysis and AOPs (e.g., excilamp/TiO₂ and excilamp/H₂O₂), demonstrated enhanced degradation performance. A novel design, incorporating a photocatalyst-coated electrode in the XeI* excilamp showed 13 times faster degradation in XeI*-excimer/H2O2 than XeI*-excimer/TiO2, attributed to an abundance of •OH generated by the modified XeI*-excimer/H2O2. A maximum energy yield of 5712 mg/kWh is obtained in the case of XeI*-excimer/H2O2. Compared with 254 nm, RB5 shows 1.26 times higher molar absorption at 222 nm. The obtained energy yield (6565 mg/kWh) for excimer-222/H2O2 demonstrates that the process is efficient in terms of energy consumption. Additionally, a non-thermal plasma (NTP) system was integrated with the KrCl* excilamp to eliminate chemical use and enhance OMP degradation. Plasma-generated NO₃⁻ and H₂O₂, activated by KrCl*, yielded a significantly higher •OH generation rate (46.7 × 10⁻⁸ M s⁻¹) than plasma plus Low Pressure UV (LPUV) lamp, due to better absorption at 222 nm. This plasma plus KrCl* system outperformed other methods in degrading various OMPs. These results highlight the potential of optimized excilamp and plasma-assisted UV-C systems for energy-efficient, chemical-free wastewater treatment. The efforts of these results will be presented.

Publication: [1]. Ram Prakash, Afaque M Hossain, UN Pal, N Kumar, K Khairnar, M Krishna Mohan "Dielectric Barrier Discharge based Mercury-free plasma UV-lamp for efficient water disinfection" Scientific Reports, 7, 17426 (2017).<br><br>[2]. Kiran Ahlawat, Ramavtar Jangra, and Ram Prakash "Environmentally Friendly UV-C Excimer Light Source with Advanced Oxidation Process for Rapid Mineralization of Azo Dye in Wastewater" ACS Omega, 9, 15615−15632 (2024). <br><br>[3]. Kiran Ahlawat, Ramavtar Jangra, and Ram Prakash "Accelerated mineralization of textile wastewater under 222 nm irradiation from dielectric barrier discharge-based Kr/Cl2 excilamp: An environmentally friendly and energy efficient approach for wastewater treatment" Scientific Reports, 14, 12560 (2024). <br><br>[4]. Kiran Ahlawat, Ramavtar Jangra and Ram Prakash "Degradation of carbamazepine and sulfamethoxazole in water by dielectric barrier discharge plasma coupled with a far UV-C (222 nm) system", Environ. Sci.: Water Res. Technol., 10, 3122-3136 (2024)

Presenters

  • Ram Prakash

    Indian Institute of Technology Jodhpur, Rajasthan, Indian Institute of Technology Jodhpur, IIT Jodhpur

Authors

  • Ram Prakash

    Indian Institute of Technology Jodhpur, Rajasthan, Indian Institute of Technology Jodhpur, IIT Jodhpur

  • Kiran Ahlawat

    Comenius University, Slovakia

  • Ramavtar Jangra

    Comenius University, Slovakia