Plasma Semiconductor Applications
FOCUS · DT1 · ID: 3430208
Presentations
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The effect of cryogenic substrate cooling on electron energy distribution in inductively coupled plasma
ORAL
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Presenters
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JONGHA AHN
Department of Electrical Engineering, Hanyang University
Authors
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JONGHA AHN
Department of Electrical Engineering, Hanyang University
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Deok-Hwan Kim
Hanyang university, Department of Electrical Engineering, Hanyang University, Department of electrical engineering, Hanyang University, Seoul, Korea
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Chin-Wook Chung
Hanyang University, Department of electrical engineering, Hanyang University, Seoul, Korea1
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Development of a Transformer-Coupled Plasma Source with Enhanced Radical Delivery and Plasma Ignition for Next-Generation Plasma Processing
ORAL
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Presenters
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Jaehoon Choi
Wonik IPS
Authors
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Jaehoon Choi
Wonik IPS
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Tae S Cho
Wonik IPS
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Development of a High-Pressure Compatible Self Plasma-Optical Emission Spectrometer for Real-Time Plasma Process Monitoring
ORAL
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Presenters
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Geon Woong Eom
Korea Institute of Machinery and Materials
Authors
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Geon Woong Eom
Korea Institute of Machinery and Materials
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SangHo Lee
Korea Institute of Machinery and Materials, Semiconfuctor Equipment Research Center, Korea Institute of Machinery and Materials
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InYong Park
Korea Institute of Machinery and Materials, Semiconfuctor Equipment Research Center, Korea Institute of Machinery and Materials
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WooSeok Kang
Korea Institute of Machinery and Materials, Semiconfuctor Equipment Research Center, Korea Institute of Machinery and Materials
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Min Hur
Korea Institute of Machinery and Materials, Semiconfuctor Equipment Research Center, Korea Institute of Machinery and Materials
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DaeWoong Kim
Korea Institute of Machinery and Materials, Semiconfuctor Equipment Research Center, Korea Institute of Machinery and Materials
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Tunable antenna array for large area microwave plasma source for semiconductor manufacturing
ORAL
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Presenters
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Giwon Shin
Wonik IPS
Authors
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Giwon Shin
Wonik IPS
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Jaehoon Choi
Wonik IPS
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Sooyoung Hwang
Wonik IPS
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Jeonghun Kim
Wonik IPS
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Hakmin Kim
Wonik IPS
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Minhee Lee
Wonik IPS
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Tae S Cho
Wonik IPS
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Beamline pressure effect on ion beam transport in ion implanters
ORAL · Invited
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Presenters
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John (Bon-Woong) Koo
Applied Materials
Authors
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John (Bon-Woong) Koo
Applied Materials
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Frank Sinclair
Applied Materials
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Paul Murphy
Applied Materials
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