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Characterization and Efficacy Analysis of a Dielectric barrier discharge based Far UV-C 222 nm Excimer light Source

POSTER

Abstract

Far UV-C radiation (207-230 nm) has demonstrated potential as an antibacterial and antiviral agent. In addition, Far UV-C radiation is safe on skin and eye tissues. Together, these characteristics have the potential to fundamentally alter how and where UV-C radiation can be deployed for air and surface disinfection.

In this work, a co-axial dielectric barrier discharge (DBD) plasma based Far UV-C excimer light source has been characterized for the maximum absolute intensity by varying the different parameters such as gas pressure, applied voltage and frequency. A mixture of krypton with a very small fraction of chlorine gas has been used in the gas gap and pinched-off for bacterial inactivation efficiency analysis. When the high voltage was supplied to the DBD excimer source, then the excitation and ionization of both the gases (Kr and Cl 2 ) takes place. The cations of krypton and anions of chlorine gas get involved in a three-body recombination reaction with an atom or molecule of buffer gas (M) and form the excited complex (KrCl*) which decomposes rapidly and emits photons having wavelength of 222 nm. For the absolute intensity measurement, a photodetector has been used. A PMT based monochromator has been used for spectroscopic analysis. A very narrow band (FWHM ~ 1.7 nm) peaking at 222 nm has been obtained. Ultimately, the developed source has been tested for its bacterial efficiency on gram positive bacteria and a 7 log reduction has been achieved within 30 sec of Far UV-C treatment having an UV dose of ~300 µJ/cm 2 .

Publication: 1) K. Ahlawat, R. Jangra, A. Ish, N. Jain, R. Prakash "An efficient DBD based low pressure narrow band 222 nm Far UV-C excimer lamp and its inactivation analysis on gram-negative and gram-positive bacteria", 2023. (Under Review in Scientific Reports)<br><br>2) K. Ahlawat, R. Jangra, R. Prakash "Eco-friendly method for treating textile effluents by combining mercury free advanced excimer UV-C source and TiO2/H2O2", 2023. (Manuscript Under Preparation)<br><br>3) K. Ahlawat, R. Jangra, A. Ish, A. Dixit, D. Fulwani, N. Jain, R. Prakash "Analysis of a UV-PCO based disinfection system for hydroxyl radicals, negative air ions generation and their impact on inactivation of pathogenic microorganisms", 2023. (Under Review in Review of Scientific Instruments)

Presenters

  • Kiran Ahlawat

    Indian Institute of Technology Jodhpur, Indian Institute of Technology, Jodhpur

Authors

  • Kiran Ahlawat

    Indian Institute of Technology Jodhpur, Indian Institute of Technology, Jodhpur

  • Ramavtar Jangra

    Indian Institute of Technology Jodhpur

  • Ram Prakash

    Indian Institute of Technology Jodhpur, Indian Institute of Technology, Jodhpur